etching time中文什么意思

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用"etching time"造句

刻蚀时间
侵蚀时间

etching: n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画， ...
time: n. 1.时，时间，时日，岁月。 2.时候，时刻；期间； ...
time of etching: 浸蚀时间
time modulation etching: 时间调制蚀刻
etching: n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画，蚀刻版，蚀刻版印刷品。 close [rough] etching (晶体的)精[粗]蚀。 electrochemical etching 电化浸蚀，电抛光。

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例句与用法

Etching time has been extended in wet etching course
在电化学刻蚀过程中，需增加循环装置。
Moreover , the octahedron voids would change to shallow orbicular pits and vanished at last if the etching time was prolonged . our results were contrasted to the result that the fpds are interstitial type defects concluded by takeno et al and support the views that the fpds are vacancy - type defects
本次的实验结果与takenold等人对fpds的研究结果大大相反，他们认为fpds的端部是一些间隙型的位错环，而本实验的实验结果却支持了fpd缺陷属空位型缺陷的观点。
This paper mainly aims at the strategic demands for large - aperture lightweight mirror proposed by high - tech development . its main research contents are : select material blank for lightweight mirror according to physical and chemical properties of optical glass ; analyze and calculate the deformation quantity of the mirror with finite element method ; design and optimize mirror body structure of 400 lightweight plane mirror and 450 lightweight spherical mirror , analyze glass cutting principle , design specisl - use grinding wheel structure , select reasonable technological parameters to implement the processing of weight reduction holes on 400 plane mirror ; analyze etching mechanism of hydrofluoric acid , look for the technological parameters such as the optimal acid concentration and etching time etc . ; eliminate the stress of weight reduction holes and micro - cracks on 400 lightweight plane mirror ; discuss the processing principle and
本论文的研究主要是瞄准国家高技术对大口径轻型镜的战略需求而开展的。主要研究内容是：根据光学玻璃的物理与化学性能，选择轻型镜坯材料；用有限元法对镜子的变形进行分析、计算，找出变形规律，优化设计400mm轻型平面镜、 450mm轻型球面镜镜体结构；分析玻璃切削原理，设计专用磨轮结构，选择合理工艺技术参数，完成400mm平面镜轻量化减重孔的加工；分析氢氟酸腐蚀光学玻璃机理，寻找最佳酸浓度、腐蚀作用时间等工艺参数，实现400mm平面镜减重孔应力与微裂纹的消除；讨论分离器加工原理和工艺技术特点，完成400mm平面轻型镜面形加工。
In this paper , the flow pattern defects ( fpds ) were revealed by secco etchant and their shape , distribution on wafer and tip structure were studied in details by optical microscope and atomic force microscope ( afm ) . the relationship between etching time and the tip structure of fpds was also discussed . furthermore , by studying the effect of rapid thermal annealing ( rta ) on the density of fpds in ar , the annihilation mechanism of fpds was discussed in this paper
本文将cz硅单晶片在secco腐蚀液中择优腐蚀后，用光学显微镜和原子力显微镜对流动图形缺陷( flowpatterndefects , fpds )在硅片中的形态、分布及其端部的微观结构进行了仔细地观察和研究，并讨论了腐蚀时间对fpds缺陷端部结构的影响；本文还通过研究ar气氛下快速退火( rapidthermalannealing , rta )对fpds缺陷密度的影响，初步探讨了fpds的消除机理。
Theoretical analysis and experimental results show that the mentioned methods above can simplify the process condition , improve the etched effect , shorten the etching time and obtain more even etched surface . 2 ) laser - assisted wet sequencially - selective - etching method has been developed this method can be applied when the corrosion solution is mixed solvent
2 )提出了激光化学诱导液相次序选择腐蚀法该方法适用于腐蚀液为混合溶剂的情况,例如, h2so4 - h2o2对gaas基片进行腐蚀时,先采用h2o2对基片进行氧化腐蚀处理,再利用h2so4进行激光化学腐蚀。

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etching time中文什么意思

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